Combined HF+MW CVD Approach for the Growth of Polycrystalline Diamond Films with Reduced Bow

A combination of two methods chemical vapor deposition (CVD) diamond films, microwave plasma–assisted (MW CVD) and hot filament (HF CVD), was used for the growth 100 µm-thick polycrystalline (PCD) layers on Si substrates. The bow HF CVD MW films showed opposite convex\concave trends; thus, combined material allowed reducing overall by a factor 2–3. Using initial 25 PCD layer achieving much higher thermal conductivity 110 film at 210 W/m·K in comparison to 130 93 pure film.